Gases used in CVD/ALD process of semiconductor manufacturing mainly include: gases used in Low-K, High-K, barrier layer and Chamber Clean. What electronic gases are used in related processes?

The high and low temperature impact airflow meter and Chamber developed by Intercooling Low Temperature Technology use clean compressed air (oil/oil molecules/water/fine dust need to be filtered) or nitrogen with purity ≥ 99.5%, oil content in the gas, oil molecules: ≤ 0.01ppm, oil mist pollutants filtered to 0.1um, intake pressure of 90~110 PSI (0.62~0.76Mpa/6.2kg~7.6kg), and intake flow of 18~35SCFM (about 8.5~16.5L/s); Standard 28SCFM (about 13.5L/S). ThermoStream TS-760 is a precise high and low temperature impact airflow instrument with a wider temperature range from - 70 ℃ to+225 ℃, providing a very advanced temperature conversion test capability. Temperature conversion from - 55 ℃ to+125 ℃ for about 10 seconds; Through long-term multi working condition verification, it meets the requirements of various production environments and engineering environments.