Gases used in CVD/ALD process of semiconductor manufacturing mainly include: gases used in Low-K, High-K, barrier layer and Chamber Clean. What electronic gases are used in related processes?

The Temperature Forcing Systems and Chamber developed by ZONGLEN use clean compressed air (oil/oil molecules/water/fine dust need to be filtered) or nitrogen with purity ≥ 99.5%, oil content in the gas, oil molecules: ≤ 0.01ppm, oil mist pollutants filtered to 0.1um, intake pressure of 90~110 PSI (0.62~0.76Mpa/6.2kg~7.6kg), and intake flow of 18~35SCFM (about 8.5~16.5L/s); Standard 28SCFM (about 13.5L/S). ThermoStream TS-760 is a precise high and low temperature impact airflow instrument with a wider temperature range from - 70 ℃ to+225 ℃, providing a very advanced temperature conversion test capability. Temperature conversion from - 55 ℃ to+125 ℃ for about 10 seconds; Through long-term multi working condition verification, it meets the requirements of various production environments and engineering environments.